羰基金属气相沉积工艺条件及膜结构研究
The investigations of membrane structure and process of chemical vapour deposition of carbonyl metals
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摘要: 在Al2O3陶瓷基片上以Mo(CO)6为源采用低压冷壁 式设备和金属有机气相沉积(MOCVD)方法制备Mo2C薄膜，探讨了该薄膜结构受温度、压力和沉积速率等工艺因素影响的关系.Abstract: The preparation of Mo2C membrane on the ceramic substrates of Al2O3 using cold-wall reactor and metal organic chemical vapour deposition (MOCVD) of Mo(CO)6 have benn developed.The effects of temperature,pressure and rate of deposition upon membrane structures are discussed.
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Key words:
- MOCVD /
- membrane structure /
- rate of deposition .
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