MOCVD制备的Mo2C膜粗糙度研究

西南师范大学学报(自然科学版)

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MOCVD制备的Mo2C膜粗糙度研究

MOCVD制备的Mo2C膜粗糙度研究[J]. 西南师范大学学报(自然科学版), 2000, 25(1).

引用本文:

MOCVD制备的Mo2C膜粗糙度研究[J]. 西南师范大学学报(自然科学版), 2000, 25(1).

The surface roughness study of Mo2C film made by MOVCD[J]. Journal of Southwest China Normal University(Natural Science Edition), 2000, 25(1).

Citation:

The surface roughness study of Mo2C film made by MOVCD[J]. Journal of Southwest China Normal University(Natural Science Edition), 2000, 25(1).

摘要: 介绍了金属有机气相沉积（MOCVD）制备Mo2C膜的过程和对膜表面粗糙度的测量结果；在测量基础上进行统计，找出Mo2C膜的高差分布；应用非平衡统计理论导出表面高差分布公式.结果表明实际测量与理论推导结果一致.
- Mo2C膜 /
- 表面高差分布 /
- 粗糙度
Abstract: The process of preparing Mo2C thin film by Metal-Organic Chemical Vapour Depostion (MOCVD) and measured data on roughness of film are provided.The distribution of interface height difference is abtained by statistical method on experimental data.By adopting theory on non-balanced statistics,the formula of distribution of height difference is obtained.Results show that there is considerable overlap amony experimental observation ,theorical analysis and computer simulation.
- Mo2C thin film /
- Distribution of interface height difference /
- interface roughness .