羰基钼化学气相沉积成膜机制及相关因素研究
Study on mechanism of CVD molybdenum films from Molybdenum Hexacarbonyl
-
摘要: 利用金属有机气相沉积（MOCVD）方法，在经过预沉积和表面研磨处理的Al2O3陶瓷基片上制备多晶钼膜.通过该薄膜的表面形态及其结构的观察分析，讨论了该薄膜的形成机制.结果表明，基片的表面形态是影响薄膜生长成核机理的重要因素，基底表面的状态设计是提高成核密度，获取优质薄膜的有效方法.Abstract: Deposition of Molybdenum films on scratched Al2O3ceramic substrate pre-deposited at low temperature has been realized.The mechanism of CVD Molybdenum films is discussed by the analysis of surface state and structure. It showed that the mechanism is influenced by the state and structure of substrates. Therefore,the design of surface state of substrate is main effect by which nucleation density can be enhanced and good Molybdenum films can be obtained.
-
Key words:
- MOCVD /
- mechanism of nucleation /
- surface state /
- pre-deposition .
-
-
计量
- 文章访问数: 600
- HTML全文浏览数: 288
- PDF下载数: 0
- 施引文献: 0
下载: